The detailed tutorial and symposium programme will be posted in the course of June.

The programme consists of tutorial sessions on Sunday, September 19, 2010 and symposium sessions from Monday, September 20 to Wednesday, September 22, 2010. For the first time, a special session will be devoted to photovoltaic applications, on 22 September. Contributions in new areas such as photovoltaics and bio-electronic applications are particularly encouraged.

The issues to be addressed include, but are not limited to, the following topics:

• Removal of contaminants in all steps of micro-, nano-electronics applications and 3D-integration
• Fundamentals of contaminants on surfaces: e.g. particle-substrate interactions
• Surface chemistry, passivation, conditioning and characterization of group IV and III/V materials (Si, Ge, GaAs and InGaAs) for sensitive FEOL  processes (high-k-metal gate stacks dielectrics, Ge surfaces, III-V, epitaxy, ALD)
• Chemical and physical cleaning in liquid, gaseous and supercritical ambient
• Trade-offs between cleaning performance, substrate damage and etching
• Contamination/particle control and its relation with process yield or performance
• Yield enhancement cleans: wafer backside, bevel
• Dry-etch resist strip and polymer removal
• Removal of modified photo resist, post etch residues and polymers
• Process and contamination diagnostics, in-situ monitoring and process control
• General issues in ultra-clean technology, ultra-pure materials and supply systems
• Environmentally friendly technologies and mass balance equations
• EUV-mask cleaning
• Surface functionalization for integrated bio-electronic sensors
• Cleaning and surface preparation for silicon substrate based solar cells such as:
• Purity requirements for solar cell fabrication
• Wet texturization processes
• Surface passivation for low surface recombination lifetime